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山崎瞬平（共）編／酸化物半導体CAAC-IGZOの物理と技術：LSIへの応用,山崎瞬平（共）編／酸化物半導体CAAC-IGZOの物理と技術：LSIへの応用,山崎瞬平（共）編／酸化物半導体CAAC-IGZOの物理と技術：LSIへの応用,シャープと半導体エネルギー研究所がディスプレイを革新する酸化,酸化物半導体を用いた高性能・高信頼トランジスタ : 知財活用Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO : Application to Lsi (Wiley-sid Series in Display Technology)2017 John Wiley and Sons酸化物半導体IGZOのLSI応用をまとめた書籍です。This book describes the application of c-axis aligned crystalline In-Ga-Zn oxide (CAAC-IGZO) technology in large-scale integration (LSI) circuits. The applications include Non-volatile Oxide Semiconductor Random Access Memory (NOSRAM), Dynamic Oxide Semiconductor Random Access Memory (DOSRAM), central processing unit (CPU), field-programmable gate array (FPGA), image sensors, and etc. The book also covers the device physics (e.g., off-state characteristics) of the CAAC-IGZO field effect transistors (FETs) and process technology for a hybrid structure of CAAC-IGZO and Si FETs. It explains an extremely low off-state current technology utilized in the LSI circuits, demonstrating reduced power consumption in LSI prototypes fabricated by the hybrid process.